Lg Innotek Co., Ltd.

JeongHo Yeon

Joo-Hyung Lee

Jun Taek Lee

Jin Su Kim

Kyoung Jong Yoo

Young-Jae Lee

Yong In Lee

JunBo Yoon

Jeong Oen Lee

A method for fabricating a large-area nanoscale pattern includes: forming multilayer main thin films isolated by passivation layers; patterning a first main thin film to form a first main pattern; forming a first spacer pattern with respect to the first main pattern; and forming a second main pattern by transferring the first spacer pattern onto a second main thin film. By using multilayer main thin films isolated by different passivation films, spacer lithography capable of reducing a pattern pitch can be repetitively performed, and the pattern pitch is repetitively reduced without shape distortion after formation of micrometer-scale patterns, thereby forming nanometer-scale fine patterns uniformly over a wide area.

Method for fabricating large-area nanoscale pattern

Growing community of inventors

Seoul, South Korea

JeongHo Yeon