Jeong Dong Kim

Title: Jeong Dong Kim: Innovator in Semiconductor Technology

Introduction

Jeong Dong Kim is a prominent inventor based in Hillsboro, OR (US). He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on enhancing the efficiency and effectiveness of semiconductor devices.

Latest Patents

One of his latest patents is titled "Catalyst-assisted chemical etching with a vapor-phase etchant." This method involves heating a semiconductor substrate that has a patterned titanium nitride layer. An oxidant and an acid are evaporated to create a vapor-phase etchant, which is then used to etch titanium nitride-covered regions of the semiconductor substrate. This process results in the formation of an etched semiconductor structure.

Another notable patent is for an "optoelectronic device having an antireflective surface." This device features a semiconductor substrate with a textured surface that includes various surface protrusions and indentations. The textured surface is created using inverse metal-assisted chemical etching, ensuring that the semiconductor substrate is largely free from ion-induced defects.

Career Highlights

Jeong Dong Kim is affiliated with the University of Illinois, where he continues to advance research in semiconductor technologies. His work has garnered attention for its innovative approaches to improving device performance and reliability.

Collaborations

He has collaborated with notable colleagues, including Xiuling Li and Munho Kim, who share his passion for advancing semiconductor technology.

Conclusion

Jeong Dong Kim's contributions to semiconductor technology through his patents and research at the University of Illinois highlight his role as a key innovator in the field. His work continues to influence the development of more efficient optoelectronic devices.