Jens Wagner

Title: Jens Wagner: Innovator in Sputter Technology

Introduction

Jens Wagner is a notable inventor based in Frankfurt-am-Main, Germany. He has made significant contributions to the field of sputter technology, holding a total of 3 patents. His work focuses on innovative materials and methods that enhance the efficiency and effectiveness of sputtering processes.

Latest Patents

One of Jens Wagner's latest patents is a silver alloy-based sputter target. This invention relates to a sputtering target that comprises a silver alloy. It features a double-layer system that includes a partially absorbing layer. The method and sputter target aim to simplify the production process while minimizing the use of reactive gases in the sputtering atmosphere. The coating is designed as an optically partially absorbing layer with an absorption coefficient of less than 0.7 at a wavelength of 550 nm and a thickness ranging from 30 to 55 nm.

Career Highlights

Throughout his career, Jens Wagner has worked with prominent companies in the field. He has been associated with Materion Advanced Materials Germany GmbH and Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung e.V. These experiences have allowed him to develop and refine his innovative ideas in sputter technology.

Collaborations

Jens Wagner has collaborated with several professionals in his field, including Martin Schlott and Albert Kastner. These partnerships have contributed to the advancement of his research and inventions.

Conclusion

Jens Wagner is a distinguished inventor whose work in sputter technology has led to valuable innovations. His patents and collaborations reflect his commitment to advancing the field and improving sputtering processes.