The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 26, 2019

Filed:

May. 18, 2015
Applicant:

Heraeus Deutschland Gmbh & Co. KG, Hanau, DE;

Inventors:

Martin Schlott, Offenbach, DE;

Albert Kastner, Hanau, DE;

Markus Schultheis, Flieden, DE;

Jens Wagner, Frankfurt, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/34 (2006.01); C03C 17/36 (2006.01); G02B 5/22 (2006.01); C23C 14/02 (2006.01); C23C 14/08 (2006.01);
U.S. Cl.
CPC ...
C23C 14/3414 (2013.01); C03C 17/36 (2013.01); C03C 17/3605 (2013.01); C03C 17/3607 (2013.01); C03C 17/3649 (2013.01); C03C 17/3657 (2013.01); C23C 14/021 (2013.01); C23C 14/025 (2013.01); C23C 14/08 (2013.01); C23C 14/083 (2013.01); G02B 5/22 (2013.01); C03C 2217/216 (2013.01); C03C 2217/218 (2013.01); C03C 2217/26 (2013.01); C03C 2218/156 (2013.01);
Abstract

A double-layer system includes a metal layer facing away from a viewer and a coating facing the viewer. In order to make the layer system production process as simple as possible and to provide a sputter deposition method that dispenses entirely with the use of reactive gases in the sputtering atmosphere or requires only a small amount thereof, the coating is in the form of an optically partially absorbing layer which has an absorption coefficient kappa of less than 0.7 at a wavelength of 550 nm and a thickness ranging from 30 to 55 nm.


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