Materion Advanced Materials Germany Gmbh

Fraunhofer-Gesellschaft Zur Foerderung Der Angewandten Forschung E.v.

Heraeus Deutschland Gmbh & Co Kg

Jens Wagner

Martin Schlott

Christoph Simons

Uwe Konietzka

Markus Schultheis

Bernd Szyszka

Sabine Schneider-Betz

Suk-Jae Lee

Volker Sittinger

Albert Kastner

Carl Christoph Stahr

Ben Kahle

Wilma Dewald

The present invention relates to a sputtering target, comprising a silver alloy comprising

Silver alloy-based sputter target

A double-layer system includes a metal layer facing away from a viewer and a coating facing the viewer. In order to make the layer system production process as simple as possible and to provide a sputter deposition method that dispenses entirely with the use of reactive gases in the sputtering atmosphere or requires only a small amount thereof, the coating is in the form of an optically partially absorbing layer which has an absorption coefficient kappa of less than 0.7 at a wavelength of 550 nm and a thickness ranging from 30 to 55 nm.

Double-layer system comprising a partially absorbing layer, and method and sputter target for producing said layer

A sputtering target for the production of layers such as optical layers, the layers produced by the target, and a method for producing the target are described. In addition to Si or a combination of Si and Al, the sputtering target contains metal oxide(s), a combination of at least two metal oxides, or a combination containing at least one metal oxide in the form of an alloy or in the form of a mixture. The sputtering target has a metal oxide fraction generated by the Si and Al and the metal oxide(s) or the combination thereof. Preferably, the metal oxide in the sputtering target is a metal oxide selected from ZrO, TaO, YO, HfO, CaO, MgO, CeO, AlO, TiOand NbO.

Metal oxide target and method for producing said metal oxide target

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Frankfurt-am-Main, Germany

Jens Wagner