Farragut, TN, United States of America

Jennifer Hay

This inventor holds 1 USPTO granted patent. Top assignee: Kla Corporation. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jennifer Hay. Retrieved from https://idiyas.com/inventor/jennifer-hay-0gchgwfl

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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Average Co-Inventor Count = 1.0

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Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Innovations of Jennifer Hay

Introduction

Jennifer Hay is an accomplished inventor based in Farragut, TN (US). She has made significant contributions to the field of measurement systems through her innovative patent. Her work focuses on enhancing the accuracy and reliability of displacement-measurement systems.

Latest Patents

Jennifer holds a patent for a device and method to calibrate or verify the displacement-measurement system of an instrumented indenter. This invention utilizes an optical detector to determine the relative depth between two positions on an inclined surface. A controller calculates the slope of the surface based on the relative depth and the distance moved. An actuator then displaces a punch at various intermediate positions, while a displacement detector measures the depth at which the sample is touched. The controller compares the measured depth to the calculated depth to ensure the accuracy of the displacement detector.

Career Highlights

Jennifer is currently employed at Kla Corporation, where she continues to develop innovative solutions in her field. Her dedication to advancing technology is evident in her work and the impact it has on measurement systems.

Collaborations

Jennifer collaborates with her coworker, Warren Oliver, to further enhance their projects and drive innovation within their team.

Conclusion

Jennifer Hay's contributions to the field of measurement systems through her patent demonstrate her commitment to innovation and accuracy. Her work at Kla Corporation continues to influence advancements in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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