Location History:
- Taipei, TW (2014)
- Hsinchu, TW (2001 - 2015)
Company Filing History:
Years Active: 2001-2015
Title: The Innovative Contributions of Jen-Rong Huang
Introduction
Jen-Rong Huang is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of thin film deposition processes and encapsulation technologies. With a total of 11 patents to his name, Huang's work has had a substantial impact on the development of optoelectronic devices.
Latest Patents
Huang's latest patents include a "Deposition nozzle and apparatus for thin film deposition process." This invention features a nozzle body with a precursor passageway that allows a precursor gas to be sprayed onto a substrate. The design ensures that the gas reacts with the substrate surface while preventing residues from leaking. Another notable patent is the "Encapsulation film, package structure utilizing the same, and method for forming the package structure." This encapsulation film combines an inorganic oxide film with an organic sealing layer, addressing moisture absorption issues commonly found in traditional sealing layers.
Career Highlights
Jen-Rong Huang is affiliated with the Industrial Technology Research Institute, where he has been instrumental in advancing research and development in his field. His innovative approaches have led to breakthroughs that enhance the performance and reliability of optoelectronic devices.
Collaborations
Huang has collaborated with notable colleagues such as Muh-Wang Liang and Chia-Ming Chen. Their combined expertise has fostered a productive research environment, leading to the successful development of various technologies.
Conclusion
Jen-Rong Huang's contributions to the field of thin film deposition and encapsulation technologies highlight his role as a leading inventor. His patents not only demonstrate his innovative spirit but also pave the way for advancements in optoelectronic applications.