This inventor holds 3 USPTO granted patents. Top assignee: N K Technology Ltd. Active years: 2004-2011.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Sunnyvale, CA (US) (2004)
- Port Hueneme, CA (US) (2010 - 2011)
Company Filing History:
Years Active: 2004-2011
Title: Innovations by Jeff Roberts in Photomask Technology
Introduction
Jeff Roberts is an accomplished inventor based in Port Hueneme, California. He has made significant contributions to the field of photomask technology, holding three patents that enhance the efficiency and accuracy of photomask handling and inspection.
Latest Patents
Roberts' latest patents include an "Automated Spatial Flipping Apparatus and System for Photomasks and Photomasks with Pellicles." This innovative device provides up to four access gates for unloading a clamped photomask after its reorientation along a single transfer axis. The clamping frames are secured by a locking control cam, preventing inadvertent opening in any orientation other than the two main flip orientations. The system integrates a digital camera and an image recognition algorithm to interpret the initial loading orientation of the photomask. Additionally, it can automatically detect a pellicle on the photomask through a pellicle detection sensor. Another notable patent is the "System and Method for Optical Photomask Inspection Through Pellicle." This method determines a pellicle correction factor by comparing measurements of a reference photomask alone with those taken through a reference pellicle. The system allows for the correction of measurement distortions caused by the pellicle, ensuring accurate data for photomask analysis.
Career Highlights
Jeff Roberts works at N&K Technology, Inc., where he applies his expertise in photomask technology. His work has been pivotal in advancing the capabilities of photomask handling and inspection systems.
Collaborations
Roberts collaborates with notable colleagues, including Marc T. Aho and Thaddeus J. Wilson, contributing to innovative projects within the company.
Conclusion
Jeff Roberts is a key figure in the field of photomask technology, with patents that significantly improve the handling and inspection processes. His contributions continue to influence advancements in this critical area of semiconductor manufacturing.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile