The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 14, 2011
Filed:
Mar. 18, 2008
Marc T. Aho, Mountain View, CA (US);
Thaddeus J. Wilson, Sunnyvale, CA (US);
Jeff Roberts, Port Hueneme, CA (US);
Marc T. Aho, Mountain View, CA (US);
Thaddeus J. Wilson, Sunnyvale, CA (US);
Jeff Roberts, Port Hueneme, CA (US);
n&k Technology Inc., San Jose, CA (US);
Abstract
A spatial photomask flipper provides up to four access gates for an unloading of a clamped photomask after its reorientation along a single photomask transfer axis. The clamping frames holding the photomask are secured by a locking control cam that prevents their inadvertent opening in any other but the two main flip orientations. The flipper is part of an automated system including a digital camera and an image recognition algorithm that interpret an arbitrary initial photomask loading orientation from a circumferential photomask identification number. An eventual pellicle on the photomask may be also automatically detected via a pellicle detection sensor. Alternately, the digital camera may be employed for pellicle detection together with a pellicle detection algorithm that processes the digital image for well known components of the pellicle such as the pellicle frame.