Jean Muller

Title: Jean Muller: Innovator in Cathodic Sputtering Technology

Introduction

Jean Muller is a notable inventor based in Voiron, France. He has made significant contributions to the field of materials science, particularly in the development of cathodic sputtering targets. With a total of 3 patents to his name, his work has advanced the technology used in bonding circuits and etching processes.

Latest Patents

Muller's latest patents include innovations in cathodic sputtering targets made of aluminum alloy. One of his inventions focuses on a cathode pulverization target characterized by its active part, which consists of a high purity aluminum alloy containing copper and iron. This alloy has a recrystallization temperature well above 20°C and an electric resistivity of less than 2.85 μΩ.cm at 20°C. The use of this target in bonding circuits reduces the frequency of voids and hillocks while maintaining resistance values comparable to those obtained with high purity aluminum alloys. Another patent involves a process using ultrasonic inspection to test the internal soundness of cathode sputtering targets. This process ensures that targets selected for applications requiring high etching fineness have minimal internal decohesions.

Career Highlights

Throughout his career, Jean Muller has worked with prominent companies such as Aluminium Pechiney. His expertise in materials science and engineering has allowed him to develop innovative solutions that enhance the performance of cathodic sputtering targets.

Collaborations

Muller has collaborated with notable professionals in his field, including Michel Leroy and Bruno Chenal. These collaborations have contributed to the advancement of technology in cathodic sputtering and materials science.

Conclusion

Jean Muller is a distinguished inventor whose work in cathodic sputtering technology has made a significant impact on the industry. His innovative patents and collaborations reflect his commitment to advancing materials science.