La Jolla, CA, United States of America

Jean-Marc Hueber

This inventor holds 7 USPTO granted patents. Top assignee: Cymer, Inc.. Active years: 2000-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jean-Marc Hueber. Retrieved from https://idiyas.com/inventor/jean-marc-hueber

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.4

ph-index = 6

Forward Citations = 338(Granted Patents)


Company Filing History:


Years Active: 2000-2003

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7 patents (USPTO):Explore Patents

Title: Innovations of Jean-Marc Hueber

Introduction

Jean-Marc Hueber is a prominent inventor based in La Jolla, California. He has made significant contributions to the field of laser technology, holding a total of seven patents. His work focuses on developing advanced laser systems that enhance performance and reliability in various applications.

Latest Patents

One of his latest patents is the ArF laser with low pulse energy and high repetition rate. This innovative modular production quality ArF excimer laser is capable of producing laser pulses at repetition rates ranging from 3,000 to 4,000 Hz or greater. It achieves pulse energies between 2 mJ to 5 mJ or more, with a full width half maximum bandwidth of about 0.4 pm or less. This laser's illumination source allows stepper or scanner equipment to produce integrated circuit resolutions of 0.10 µm (100 nm) or less. The design includes replaceable modules such as a laser chamber, a modular pulse power system, and a line narrowing module. The higher repetition rate provides two key advantages: lower per pulse energy reduces optical damage, and the increased number of pulses for a specified illumination dose enhances dose stability.

Another notable patent is for gas discharge laser long life electrodes. This invention features a gas discharge laser with a chamber containing two elongated erodable electrode elements. Each element has an erodable section and is designed to minimize turbulence in the discharge region of the laser gas. The configuration allows for gradual erosion over more than 8 billion pulses without significant changes in the shape of electrical discharges. The system includes a pulse power system that delivers electrical pulses of at least 2J at rates of at least 2 KHz, along with a blower that circulates laser gas at speeds of at least 2 m/s and a heat exchanger to manage heat produced by the system.

Career Highlights

Jean-Marc Hueber is currently employed at Cymer, Inc., where he continues to innovate in the field of laser technology. His work has been instrumental in advancing the capabilities of laser systems used in various industries.

Collaborations

He has collaborated with notable colleagues, including Richard G Morton and William N Partlo, contributing to the development of cutting-edge laser technologies.

Conclusion

Jean-Marc Hueber's contributions to laser technology through his patents and work at Cymer, Inc. highlight

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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