Tigard, OR, United States of America

Jayasimha S Prasad

This inventor holds 1 USPTO granted patent. Top assignee: Tektronix, Inc.. Active years: 1993.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Jayasimha S Prasad. Retrieved from https://idiyas.com/inventor/jayasimha-s-prasad-g4z6bdpq

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 41(Granted Patents)


Company Filing History:


Years Active: 1993

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1 patent (USPTO):Explore Patents

Title: Innovations of Jayasimha S Prasad

Introduction

Jayasimha S Prasad is a notable inventor based in Tigard, Oregon, known for his contributions to the field of integrated circuit technology. He has developed innovative processes that enhance the performance and efficiency of electronic components. His work has significant implications for the advancement of semiconductor technology.

Latest Patents

Jayasimha S Prasad holds a patent for an "Implant-free heterojunction bipolar transistor integrated circuit process." This patent describes a process capable of fabricating npn heterojunction bipolar transistors, Schottky diodes, MIM capacitors, spiral inductors, and NiCr resistors. The process features two levels of interconnect metal, with the first level being a conventional dielectric-insulated metal conductor. The second level includes an air-bridge for contacting the HBT emitters, which are positioned atop three-level mesa structures. This advanced low-loss, low-capacitance air dielectric conductor is particularly useful for long interconnects and inductors. MIM capacitors are created by sandwiching silicon nitride between the first layer metal and a capacitor top plate made with landed air-bridge metal. Precision thin film resistors are fabricated by depositing NiCr on silicon nitride. The three-level active mesa structure is etched down to the GaAs substrate for lateral device isolation, featuring a truncated pyramidal shape that allows for good step coverage of dielectric and metallization layers. The wet etching process employs a composition of H₃PO₄:H₂O₂:H₂O in a preferred ratio of about 3:1:25 for the AlGaAs/GaAs system.

Career Highlights

Jayasimha S Prasad is currently employed at Tektronix, Inc., where he continues to innovate and contribute to the field of electronics. His work at Tektronix has positioned him as a key player in the development of advanced electronic components.

Collaborations

Some of his notable coworkers include Song W Park and William A Vetanen, who have collaborated with him on various projects within the company.

Conclusion

Jayasimha S Prasad's innovative work in integrated circuit technology exemplifies the advancements being made in the field of electronics. His contributions, particularly through his patented processes, are paving the way for future developments in semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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