Eindhoven, Netherlands

Javier Augusto Loaiza Rivas

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Javier Augusto Loaiza Rivas. Retrieved from https://idiyas.com/inventor/javier-augusto-loaiza-rivas

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Innovator Spotlight: Javier Augusto Loaiza Rivas

Introduction:

Javier Augusto Loaiza Rivas is a talented inventor based in Eindhoven, Netherlands, known for his groundbreaking work in the field of patterning technology. With a keen eye for innovation, he has contributed significantly to the advancement of beam scanning methods in the manufacturing industry.

Latest Patents:

Javier Augusto Loaiza Rivas holds one patent titled "Method and apparatus for configuring spatial dimensions of a beam during a scan." This patent focuses on enhancing the quality of patterns exposed onto substrates by precisely configuring the spatial dimensions of a scanning beam of photons or particles across a patterning device.

Career Highlights:

Currently affiliated with ASML Netherlands B.V., Javier Augusto Loaiza Rivas plays a pivotal role in driving technological advancements within the company. His expertise in spatial resolution and beam manipulation has been instrumental in improving the efficiency and accuracy of patterning processes.

Collaborations:

Javier Augusto Loaiza Rivas collaborates closely with esteemed colleagues such as Daan Maurits Slotboom and Hermannes Theodorus Heijmerikx. Together, they form a dynamic team dedicated to pushing the boundaries of innovation in the realm of beam scanning technology.

Conclusion:

In conclusion, Javier Augusto Loaiza Rivas stands out as a visionary inventor with a passion for revolutionizing the way patterns are exposed onto substrates. His contributions to the field of spatial dimension configuration in beam scanning have earned him recognition among his peers and solidified his reputation as a trailblazer in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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