The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Aug. 01, 2019
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Daan Maurits Slotboom, Wolphaartsdijk, NL;
Hermannes Theodorus Heijmerikx, Eindhoven, NL;
Javier Augusto Loaiza Rivas, Eindhoven, NL;
Jeroen Cottaar, Eindhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70358 (2013.01); G03F 7/70258 (2013.01); G03F 7/70625 (2013.01); G03F 7/70633 (2013.01);
Abstract
A method of configuring a step of scanning a beam of photons or particles across a patterning device for exposing a pattern onto a substrate, wherein the method includes determining a spatial resolution of a patterning correction configured to improve quality of the exposing, and determining a spatial dimension of the beam based on the determined spatial resolution of the patterning correction.