Eindhoven, Netherlands

Hermannes Theodorus Heijmerikx

This inventor holds 1 USPTO granted patent. Top assignee: Asml Netherlands B.v.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Hermannes Theodorus Heijmerikx. Retrieved from https://idiyas.com/inventor/hermannes-theodorus-heijmerikx

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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% Patents Active = 100.0

Average Co-Inventor Count = 4.0

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Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Unveiling the Inventive Genius of Hermannes Theodorus Heijmerikx

Introduction: Hermannes Theodorus Heijmerikx, a visionary inventor, hails from the innovative city of Eindhoven, NL. With a notable contribution in the world of technology, he holds a patent that revolutionizes the spatial dimensions of beam scanning processes.

Latest Patents: Heijmerikx boasts 1 patent, encompassing a groundbreaking method and apparatus for configuring spatial dimensions of a beam during a scan. This patent showcases his expertise in enhancing the quality of patterning correction in the exposure of patterns onto substrates.

Career Highlights: Currently associated with the prestigious company ASML Netherlands B.V., Heijmerikx's professional journey is adorned with milestones of innovation and creativity. His dedication to pushing the boundaries of technology is evident in his patent portfolio.

Collaborations: Heijmerikx thrives in collaborative environments, engaging closely with coworkers such as Daan Maurits Slotboom and Javier Augusto Loaiza Rivas. Together, they form a formidable team driving technological advancements in their domain.

Conclusion: Hermannes Theodorus Heijmerikx stands as a beacon of innovation in Eindhoven, NL, leaving an indelible mark on the realm of beam scanning technologies. His passion for advancing spatial dimensions and quality in patterning correction is a testament to his ingenuity and commitment to technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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