Location History:
- St. Pete, FL (US) (2006)
- Largo, FL (US) (2009 - 2012)
Company Filing History:
1 out of 17 
1 out of 1 
3 out of 832,843 Years Active: 2006-2012
Title: Jason Plumhoff: Innovator in Photolithography
Introduction
Jason Plumhoff, an accomplished inventor based in Largo, FL, has made significant contributions to the field of photolithography. With a total of five patents to his name, Plumhoff continues to push the boundaries of innovation in the semiconductor industry through his groundbreaking inventions.
Latest Patents
Among his latest patents, Plumhoff has introduced a "Method to Minimize CD Etch Bias." This invention provides a sophisticated approach to enhancing critical dimension performance during plasma etching processes. By carefully monitoring the critical dimension performance of a photolithographic substrate, his method ensures that target uniformity and feature widths are achieved through tailored adjustments in the deposition and etch plasma processing.
Another notable patent is the "Temperature Control Method for Photolithographic Substrate." This innovation outlines a procedure for effectively managing the temperature of photolithographic substrates. It involves cooling the substrate to a target temperature below zero degrees Celsius using a heat transfer fluid before subjecting it to a plasma process, thereby enhancing the efficiency and performance of the etching process.
Career Highlights
Throughout his career, Jason Plumhoff has worked with leading companies in the field, including Unaxis USA Inc. His experiences in various roles have allowed him to refine his skills and develop a deep understanding of photolithographic techniques, contributing to his success as an inventor.
Collaborations
Plumhoff has collaborated with several notable coworkers, including Russell Westerman and David J. Johnson. These partnerships have played a crucial role in nurturing innovative ideas and improving the overall quality of their work.
Conclusion
In conclusion, Jason Plumhoff stands out as a prominent figure in the realm of photolithography, with a remarkable portfolio of patents that reflect his commitment to innovation. His contributions continue to shape the industry, paving the way for advancements in semiconductor manufacturing.