The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 07, 2006
Filed:
May. 03, 2004
Christopher Constantine, Safety Harbor, FL (US);
Jason Plumhoff, St. Pete, FL (US);
Russell Westerman, Largo, FL (US);
David J. Johnson, Palm Harbor, FL (US);
Christopher Constantine, Safety Harbor, FL (US);
Jason Plumhoff, St. Pete, FL (US);
Russell Westerman, Largo, FL (US);
David J. Johnson, Palm Harbor, FL (US);
Unaxis USA Inc., St. Petersburg, FL (US);
Abstract
The present invention provides a method and an apparatus for etching a photolithographic substrate. The photolithographic substrate is placed on a support member in a vacuum chamber. A processing gas for etching a material from the photolithographic substrate is introduced into the vacuum chamber, and a plasma is generated. An RF bias is supplied to the support member in the vacuum chamber through an RF bias frequency generator at or below the ion transit frequency. Exposed material is etched from the photolithographic substrate with improved CD Etch Linearity and CD Etch Bias since the low frequency bias allows the developed charge on the photolithographic substrate, generated by the plasma, to dissipate.