Company Filing History:
2 out of 24,195 
2 out of 17 
1 out of 1,765 
Years Active: 1997-2006
Title: The Innovative Journey of Christopher Constantine
Introduction
Christopher Constantine, an inventive mind based in Safety Harbor, FL, has made significant contributions to the field of photolithography through his impressive portfolio of patents. With a total of five patents to his name, Constantine's work is characterized by breakthroughs in etching technologies that enhance the efficiency and effectiveness of photomasks.
Latest Patents
Among his notable patents, two stand out for their technological advancements. The first is focused on the etching of chromium layers on photomasks utilizing high-density plasma and low-frequency RF bias. This invention proposes a method and an apparatus for etching a photolithographic substrate, where a processing gas is introduced into a vacuum chamber and a plasma is generated to etch the material from the substrate. The innovation significantly improves critical dimension (CD) etch linearity and bias by allowing dissipated charge from the substrate, thereby enhancing the etching process.
The second significant invention is the embedded attenuated phase shift mask (EAPSM) and the method of creating it. This patent includes an etch stop layer that can be plasma etched with high selectivity to the underlying quartz substrate. This selectivity is crucial for maintaining a uniform 180-degree phase shift across the mask, allowing for the use of conventional plasma etching techniques without damaging the quartz substrate.
Career Highlights
Constantine has had a fruitful career, contributing to the advancement of photolithographic technologies through his work at prestigious organizations such as Xerox Corporation and Unaxis USA Inc. His innovative mindset has enabled him to apply theoretical principles in real-world applications, establishing him as a notable contributor to the field.
Collaborations
Throughout his career, Constantine has collaborated with talented professionals, including Daniel E. Kuhman and Kevin N. Beatty. These collaborations have fostered a rich exchange of ideas and have further propelled the advancement of the technologies in which they worked.
Conclusion
Christopher Constantine is a testament to the power of innovation and dedication within the field of photolithography. His patents not only reflect his inventive spirit but also mark significant milestones in technology that enhance manufacturing processes. With a solid foundation of experience and a commitment to advancing his field, Constantine continues to inspire future generations of inventors and innovators.