This inventor holds 3 USPTO granted patents and 1 published patent application and 2 EPO patents. Top assignee: Cabot Microelectronics Corporation. Active years: 2008-2013.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Aurora, IL (US) (2008)
- Joliet, IL (US) (2011 - 2013)
Company Filing History:
Years Active: 2008-2013
Title: Jason Keleher: Innovator in Chemical-Mechanical Polishing Technologies
Introduction
Jason Keleher, a notable inventor based in Joliet, IL, has made significant contributions to the field of chemical-mechanical polishing (CMP) technologies. With three patents to his name, Keleher's work focuses on advancing methods and compositions that enhance the performance of polishing substrates containing copper and silver.
Latest Patents
Keleher’s latest innovations include two key patents:
1. **Metal-passivating CMP compositions and methods** - This invention provides CMP compositions and methods specifically designed for polishing substrates that contain copper and/or silver. The compositions feature a unique blend of a particulate abrasive, primary film-forming metal-complexing agents, and secondary film-forming metal-passivating agents, all within an aqueous carrier.
2. **Copper-passivating CMP compositions and methods** - This patent presents CMP methods aimed at polishing copper-containing substrates. The innovative approach includes abrading surfaces with a CMP composition that incorporates a copper-complexing agent, a specialized copper-passivating agent, and an oxidizing agent such as hydrogen peroxide, enhancing the polishing process's effectiveness.
Career Highlights
Jason Keleher currently works at Cabot Microelectronics Corporation, where he leverages his expertise to develop advanced polishing technologies. His dedication to innovation in the CMP domain has significantly improved substrate processing outcomes in various applications.
Collaborations
Throughout his career, Keleher has worked alongside talented professionals, including Pankaj K Singh and Vlasta A Brusic. These collaborations have likely enriched his research and development efforts, contributing to the successful patenting of his CMP innovations.
Conclusion
Jason Keleher’s contributions to chemical-mechanical polishing illustrate the impact of innovative thinking in material processing. His patents demonstrate his commitment to enhancing substrate polishing techniques, reflecting his status as a leading inventor in this specialized field. As technology continues evolving, Keleher's work will undoubtedly play a vital role in shaping the future of CMP applications.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile