Jared Stoeger

Title: The Innovative Contributions of Jared Stoeger

Introduction

Jared Stoeger is a notable inventor based in Portland, Oregon, recognized for his significant contributions to semiconductor technology. With a total of three patents to his name, Stoeger has made strides in enhancing the functionality and efficiency of electronic devices.

Latest Patents

One of Stoeger's latest patents focuses on "Capacitor connections in dielectric layers." This invention describes techniques for a semiconductor device that includes a substrate. The first capacitor consists of a top plate and a bottom plate positioned above the substrate. The top plate is connected to a metal electrode within an inter-level dielectric (ILD) layer, allowing access to the first capacitor. Similarly, a second capacitor is detailed, which also includes a top plate and a bottom plate, with its top plate coupled to a second metal electrode within the ILD layer. Notably, the second metal electrode is disjoint from the first, enabling access to the first capacitor through its respective metal electrode without interference from the second capacitor.

Career Highlights

Stoeger is currently employed at Intel Corporation, a leading company in semiconductor manufacturing and technology. His work at Intel has positioned him at the forefront of innovation in the electronics industry, where he continues to develop advanced technologies.

Collaborations

Throughout his career, Stoeger has collaborated with esteemed colleagues, including Chieh-Jen Ku and Bernhard Sell. These partnerships have fostered a creative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Jared Stoeger's contributions to the field of semiconductor technology through his patents and work at Intel Corporation highlight his role as an influential inventor. His innovative approaches continue to shape the future of electronic devices.