Daejeon, South Korea

Jang Yul Kim



Average Co-Inventor Count = 5.4

ph-index = 1

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2009-2013

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5 patents (USPTO):Explore Patents

Title: Jang Yul Kim: Innovator in Semiconductor Materials

Introduction

Jang Yul Kim is a prominent inventor based in Daejeon, South Korea. He has made significant contributions to the field of semiconductor materials, particularly in the development of cerium oxide and cerium carbonate powders. With a total of 5 patents to his name, Kim's work has been instrumental in advancing chemical mechanical polishing (CMP) processes in semiconductor fabrication.

Latest Patents

Among his latest patents, Kim has developed a cerium oxide powder specifically designed for CMP abrasives. This innovation improves the polishing selectivity of silicon oxide layers compared to silicon nitride layers, addressing within-wafer non-uniformity during the CMP process. The cerium oxide powder is derived from cerium carbonate with a hexagonal crystal structure, enhancing its effectiveness in semiconductor applications. Additionally, he has patented a method for preparing cerium carbonate powder by mixing cerium and carbonate precursor solutions, utilizing organic solvents to control the size and shape of the resultant powders.

Career Highlights

Jang Yul Kim is currently employed at LG Chem, Ltd., where he continues to push the boundaries of material science in the semiconductor industry. His innovative approaches have garnered attention and recognition within the field, contributing to the advancement of semiconductor technologies.

Collaborations

Kim has collaborated with notable colleagues, including Seung Beom Cho and Jun Seok Nho, to further enhance the research and development of semiconductor materials.

Conclusion

Jang Yul Kim's contributions to the semiconductor industry through his innovative patents and collaborative efforts highlight his role as a key figure in advancing material science. His work continues to influence the efficiency and effectiveness of semiconductor fabrication processes.

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