The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Sep. 01, 2006
Seung Beom Cho, Daejeon, KR;
Jun Seok Nho, Daejeon, KR;
Dong Mok Shin, Daejeon, KR;
Jong Pil Kim, Daejeon, KR;
Myoung Hwan OH, Daejeon, KR;
Jang Yul Kim, Daejeon, KR;
Eun MI Choi, Seongnam-si, KR;
Min Jin Ko, Daejeon, KR;
Seung Beom Cho, Daejeon, KR;
Jun Seok Nho, Daejeon, KR;
Dong Mok Shin, Daejeon, KR;
Jong Pil Kim, Daejeon, KR;
Myoung Hwan Oh, Daejeon, KR;
Jang Yul Kim, Daejeon, KR;
Eun Mi Choi, Seongnam-si, KR;
Min Jin Ko, Daejeon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
A cerium oxide powder for one-component CMP slurry, which has a specific surface area of 5 m/g or more, and a ratio of volume fraction of pores with a diameter of 3 nm or more to that of pores with a diameter less than 3 nm of 8:2˜2:8, is disclosed. A method for preparing the same, a one-component CMP slurry comprising the same as an abrasive material, and a method of shallow trench isolation using the one-component CMP slurry are also disclosed. The CMP slurry causes no precipitation of the cerium oxide powder even if it is provided as a one-component CMP slurry, because the CMP slurry uses, as an abrasive material, cerium oxide powder that is obtained via a low-temperature calcination step, optionally a pulverization step, and a high-temperature calcination step and has a high pore fraction and low strength.