Jang-Ho Shin

Title: Jang-Ho Shin: Innovator in Semiconductor Technology

Introduction

Jang-Ho Shin is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 2 patents. His work focuses on enhancing the efficiency and accuracy of semiconductor devices.

Latest Patents

One of Jang-Ho Shin's latest patents is titled "Semiconductor device having overlay measurement mark and method of fabricating the same." This invention provides a semiconductor device that includes a scribe line region on a semiconductor substrate. It features a first main scale layer with a first group of line and space patterns, along with a second group of line and space patterns. Additionally, line-shaped second main scale patterns and vernier scale patterns are incorporated to improve measurement precision.

Another notable patent is the "Photomask for measuring lens aberration, method of its manufacture, and method of its use." This photomask includes a transparent substrate with a reference pattern group and an encoded pattern group formed on its second surface. The design enhances light throughput and measurement efficiency, making it a valuable tool for lens aberration measurement.

Career Highlights

Jang-Ho Shin is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge innovations in semiconductor technology.

Collaborations

Throughout his career, Jang-Ho Shin has collaborated with talented coworkers, including Sang-Gyun Woo and Gi-Sung Yeo. These collaborations have further enriched his work and contributed to the advancements in the field.

Conclusion

Jang-Ho Shin is a notable inventor whose contributions to semiconductor technology have made a significant impact. His innovative patents reflect his dedication to improving the efficiency and accuracy of semiconductor devices.