This inventor holds 2 USPTO granted patents. Top assignee: Basf Aktiengesellschaft. Active years: 2003-2004.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2003-2004
Title: Jürgen Ettmüller: Innovator in Particle Measurement Technology
Introduction
Jürgen Ettmüller is a notable inventor based in Hassloch, Germany, recognized for his contributions to the field of particle measurement technologies. With two patents to his name, Ettmüller's innovative approach has paved the way for advancements in both gas particle analysis and spectroscopic fluid analysis. His expertise in these areas showcases the potential impacts of his inventions on various scientific applications.
Latest Patents
Ettmüller's latest patents reflect his commitment to enhancing measurement techniques. The first patent, titled "Method and apparatus for determining physical collective parameters of particles of gases," introduces a sophisticated apparatus designed to measure the physical collective parameters of gas particles. This invention comprises a measuring chamber equipped with light entrance and exit ports for electromagnetic radiation, along with an emission source and dual detection apparatuses that measure the intensity of scattered radiation from particles. The method outlined in the patent allows for the determination of particle parameters based on the intensities of radiation within different scattering regions.
His second patent, "Apparatus for spectroscopic analysis of a fluid medium by attenuated reflection," presents a probe-like apparatus for analyzing fluid media through attenuated reflection techniques. This apparatus uses two light beams that strike the boundary between a prism and the fluid medium under examination, with the light being reflected at varying angles and polarization states. Measurement under total reflection conditions significantly enhances the analysis process, demonstrating Ettmüller's innovative thinking in spectroscopy.
Career Highlights
Ettmüller is associated with BASF Aktiengesellschaft, a leading chemical company known for its commitment to innovation. His role within the organization allows him to leverage cutting-edge research and development resources, contributing to the advancement of technologies in particle measurement.
Collaborations
Throughout his career, Ettmüller has collaborated with esteemed colleagues, including Camiel Heffels and Matthias Rädle. These partnerships reflect a dedication to teamwork and interdisciplinary cooperation, further enhancing the potential impact of his inventions.
Conclusion
Jürgen Ettmüller's contributions to the fields of particle measurement and spectroscopic analysis demonstrate significant innovation and expertise. His patents not only reflect his inventiveness but also highlight the importance of collaboration within scientific research. As his work continues to evolve, Ettmüller remains a significant figure in the landscape of technological advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
