The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 06, 2004

Filed:

Jul. 27, 2001
Applicant:
Inventors:

Bernd Sachweh, Meckenheim, DE;

Camiel Heffels, Gernsheim, DE;

Matthias Rädle, Weisenheim am Berg, DE;

Helmut Biermann, Bobenheim-Roxheim, DE;

Hans Jürgen Eisen, Ludwigshafen, DE;

Jürgen Ettmüller, Hassloch, DE;

Johannes G Reuvers, Hohen-Sülzen, DE;

Assignee:

BASF Aktiengesellschaft, Ludwigshafen, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 2/100 ;
U.S. Cl.
CPC ...
G01N 2/100 ;
Abstract

The present invention creates an apparatus for determining physical collective parameters of particles in gases, which comprises a measuring chamber with light entrance ports ( ) and exit ports ( ) for electromagnetic radiation, an emission source ( ) for electromagnetic radiation being provided and at least two detection apparatuses ( ) for determining the intensity of electromagnetic radiation scattered at the particles being provided, and the detection apparatuses ( ) detecting electromagnetic radiation of different scattering regions. The present invention further creates a method for determining physical collective parameters of particles in gases, the particles being exposed to electromagnetic radiation which is scattered at the particles, wherein the intensities of the scattered radiation of at least two different scattering regions are determined and their ratio is taken subsequently.


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