Jan Hendrik Peters

Title: Jan Hendrik Peters: Innovator in EUV Mask Technology

Introduction

Jan Hendrik Peters is a notable inventor based in Radebeul, Germany. He has made significant contributions to the field of extreme ultraviolet (EUV) mask technology. With a total of 2 patents, Peters has developed innovative methods that enhance the analysis and localization of defects on substrates.

Latest Patents

Peters' latest patents include a method for localizing defects on substrates for EUV masks. This method utilizes a phase contrast optical unit equipped with a phase mask to examine the substrate effectively. Another significant patent is for a method and system for EUV mask blank buried defect analysis. This reflective mask inspection system employs a short wavelength radiation source to irradiate a reflective mask. A detector system captures the short wavelength radiation reflected from the mask, while a controller compares reflectance images to characterize the mask. This system analyzes the spatially resolved reflectance characteristics of the substrate from various angles, providing a comprehensive analysis of buried defects, which improves upon existing systems that rely solely on atomic force microscopes.

Career Highlights

Throughout his career, Jan Hendrik Peters has worked with prominent companies in the industry, including Carl Zeiss SMT GmbH and Carl Zeiss AG. His experience in these organizations has contributed to his expertise in the field of optical technologies and defect analysis.

Collaborations

Peters has collaborated with notable professionals in his field, including Jörg Frederik Blumrich and Dirk Seidel. These collaborations have further enriched his work and contributed to advancements in EUV mask technology.

Conclusion

Jan Hendrik Peters stands out as an influential inventor in the realm of EUV mask technology. His innovative patents and collaborations have significantly impacted the industry, paving the way for future advancements in defect analysis and localization.