Goettingen, Germany

Jan Gerkens


 

Average Co-Inventor Count = 6.5

ph-index = 1


Company Filing History:


Years Active: 2020-2021

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2 patents (USPTO):Explore Patents

Title: The Innovations of Jan Gerkens: A Pioneer in Thin Inorganic Films

Introduction: Jan Gerkens is an esteemed inventor based in Goettingen, Germany. With two patents to his name, he has made significant strides in the field of thin inorganic films, particularly through his work at BASF SE Corporation. His innovative approaches aim to enhance the processes involved in the atomic layer deposition of these materials.

Latest Patents: Gerkens' latest patents focus on novel processes for generating thin inorganic films on substrates. The first patent entails a method involving the deposition of a compound with the general formula (I) onto solid substrates. In this case, M can represent manganese (Mn), nickel (Ni), or cobalt (Co) while X acts as a coordinating ligand. The process emphasizes the careful selection of alkyl, alkenyl, aryl, and halogen groups to optimize film quality.

In his second patent, Gerkens explores a similar process that involves bringing the compound into a gaseous or aerosol state before deposition. This innovation outlines the importance of varying parameters like the number of ligands and chemical groups, thereby streamlining the methodology involved in material fabrication.

Career Highlights: Throughout his career, Gerkens has established himself as a leader in the development of processes related to thin inorganic films. His work has been pivotal in the advancement of technologies that rely on these materials, making substantial contributions to both academic and industrial realms.

Collaborations: Jan Gerkens has collaborated with fellow innovators such as Torben Adermann and Hagen Wilmer at BASF SE Corporation. Their combined expertise fosters an environment ripe for creative solutions and breakthrough inventions in material science.

Conclusion: Jan Gerkens continues to make an impact in the field of thin inorganic films with his innovative patents and collaborative initiatives at BASF SE Corporation. His commitment to exploring advanced deposition techniques positions him as an influential figure in this essential area of research and development.

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