The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 23, 2021
Filed:
Aug. 23, 2017
Basf SE, Ludwigshafen am Rhein, DE;
Torben Adermann, Ludwigshafen, DE;
Falko Abels, Ludwigshafen, DE;
Carolin Limburg, Ludwigshafen, DE;
Hagen Wilmer, Ludwigshafen, DE;
Jan Gerkens, Goettingen, DE;
Sven Schneider, Goettingen, DE;
BASF SE, Ludwigshafen am Rhein, DE;
Abstract
The present invention is in the field of processes for the generation of thin inorganic films on substrates, in particular atomic layer deposition processes. The present invention relates to a process for the generation of inorganic films comprising depositing the compound of general formula (I) onto a solid substrate (I), wherein M is Mn, Ni or Co, X is a ligand which coordinates M, n is 0, 1, 2, 3, or 4, Ris an alkyl group, an alkenyl group, an aryl group, a halogen, or a silyl group, Ris an alkyl group, an alkenyl group, an aryl group, or a silyl group, p and q are 1 or 2, wherein p+q=3, and m is 1, 2, or 3.