Jan Doise

Title: Jan Doise: Innovator in Organometallic Coatings

Introduction

Jan Doise is a prominent inventor based in Leuven, Belgium. He has made significant contributions to the field of organometallic coatings, particularly in the context of radiation patterning technologies. With a total of 5 patents to his name, Doise's work is at the forefront of innovation in this specialized area.

Latest Patents

One of Jan Doise's latest patents focuses on "Organometallic radiation patternable coatings with low defectivity and corresponding methods." This invention addresses the formation of radiation patternable structures, especially for extreme ultraviolet (EUV) patterning. The patent describes wafer structures that include a substrate with a smooth top surface and a radiation-sensitive organometallic coating. This coating has an average thickness of no more than 100 nm and maintains a defect rate of no more than about 1 defect per square centimeter, with a defect size greater than 48 nm, evaluated with a 3 mm edge exclusion. The methods outlined for creating a low defect coating involve spin coating a purified radiation-sensitive organometallic resist solution onto a wafer, followed by drying to achieve the desired coating characteristics. Additionally, methods for improved filtering for particle removal from radiation patternable organometallic resist compositions are also provided.

Another notable patent is a method for forming a cross-linked layer on a substrate. This method is designed to direct the self-assembly of a self-assembling material. It includes providing a structure with a substrate, applying a layer of a photo- and thermally cross-linkable substance, and then partially photocrosslinking the substance before further thermally cross-linking it to form the cross-linked layer.

Career Highlights

Jan Doise has worked with esteemed organizations such as Imec Vzw and Katholieke Universiteit Leuven, also known as KU Leuven R&D. His experience in these institutions has allowed him to develop and refine his innovative ideas in the field of organometallic coatings.

Collaborations

Throughout his career, Jan has collaborated with notable colleagues, including Emily Gallagher and Roel Gronheid. These partnerships have contributed to the advancement of his research and the successful development of his patents.

Conclusion

Jan Doise is a key figure in the innovation of organometallic coatings, with a focus