This inventor holds 1 USPTO granted patent. Top assignee: Intel Corporation. Active years: 2025.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2025
Title: Innovations of James Wade in Integrated Circuit Technology
Introduction
James Wade is an accomplished inventor based in Hillsboro, OR (US). He has made significant contributions to the field of integrated circuit technology. His innovative approach has led to the development of a unique patent that enhances the performance and reliability of electronic devices.
Latest Patents
James Wade holds a patent for "Through-substrate underfill formation for an integrated circuit assembly." This patent describes a method for fabricating an integrated circuit package by disposing an underfill material between an electronic substrate and an integrated circuit device through an opening in the electronic substrate. The assembly includes an electronic substrate with a first surface and an opposing second surface, featuring at least one opening extending from the first surface to the second surface. The integrated circuit device is electrically attached to the electronic substrate with at least one interconnect, and the underfill material is strategically placed to enhance the connection.
Career Highlights
James Wade is currently employed at Intel Corporation, where he continues to push the boundaries of technology. His work focuses on improving the efficiency and effectiveness of integrated circuit assemblies. With a patent portfolio that includes 1 patent, he has established himself as a key player in the industry.
Collaborations
James has collaborated with notable colleagues such as Eng Huat Goh and Kyle Davidson. Their combined expertise has contributed to advancements in integrated circuit technology.
Conclusion
James Wade's innovative contributions to integrated circuit technology exemplify the impact of dedicated inventors in the tech industry. His patent for through-substrate underfill formation showcases his commitment to enhancing electronic device performance.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
