James R Gardiner

Title: The Innovations of James R. Gardiner

Introduction

James R. Gardiner is a notable inventor based in Wappingers Falls, NY (US). He has made significant contributions to the field of technology, particularly in the area of polysilicon devices. With a total of 5 patents to his name, Gardiner's work has had a lasting impact on the industry.

Latest Patents

Among his latest patents is the "Double polysilicon contact structure." This invention describes a contact structure in a double polysilicon device that overcomes direct shorts between overlying polysilicon conductors caused by a 'polysilicon void phenomenon.' Gardiner's innovative approach involves patterning an appropriate etch stop between the conductors to prevent these shorts. Another patent, titled "Double polysilicon contact structure and process," elaborates on the same concept, further emphasizing the importance of this technology in enhancing device performance.

Career Highlights

James R. Gardiner is currently employed at International Business Machines Corporation, commonly known as IBM. His work at IBM has allowed him to collaborate with some of the brightest minds in the industry, contributing to advancements in technology and innovation.

Collaborations

Some of Gardiner's notable coworkers include Martin Revitz and Joseph F. Shepard. Their collaborative efforts have played a crucial role in the development of groundbreaking technologies within the company.

Conclusion

James R. Gardiner's contributions to the field of technology through his patents and collaborations highlight his innovative spirit and dedication to advancing the industry. His work continues to influence the development of polysilicon devices, showcasing the importance of innovation in technology.