This inventor holds 2 USPTO granted patents. Top assignee: Kla Tencor Corporation. Active years: 2016.
Company Filing History:
Years Active: 2016
Title: The Innovative Contributions of James Manka
Introduction
James Manka is a notable inventor based in Sunnyvale, CA. He has made significant contributions to the field of lithography, particularly in focus monitoring methods. With a total of 2 patents to his name, Manka's work has had a considerable impact on the industry.
Latest Patents
Manka's latest patents include a focus monitoring method using asymmetry embedded imaging target. This method involves measuring profile asymmetries in a target feature, including sub-resolution assist features, and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. Additionally, he has developed a focus recipe determination for a lithographic scanner. This method detects an optical signal from at least one test sample for various programmed focus error values, allowing for the determination of focus values based on selected variable sensitivities.
Career Highlights
James Manka is currently employed at KLA-Tencor Corporation, where he continues to innovate in the field of lithography. His work is essential for improving the precision and efficiency of lithographic processes.
Collaborations
Manka has collaborated with notable colleagues such as David Tien and Bill Pierson, contributing to advancements in their shared field of expertise.
Conclusion
James Manka's contributions to lithography through his innovative patents and collaborations highlight his importance as an inventor. His work continues to influence the industry and drive technological advancements.