The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2016
Filed:
Jun. 03, 2013
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventors:
DongSub Choi, Yongin, KR;
Bill Pierson, Austin, TX (US);
David Tien, Santa Clara, CA (US);
James Manka, Sunnyvale, CA (US);
Dongsuk Park, WhaSung, KR;
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); G03F 1/00 (2012.01); G06T 7/00 (2006.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G03F 1/00 (2013.01); G06T 7/0002 (2013.01); G06T 2207/30148 (2013.01); G06T 2207/30168 (2013.01);
Abstract
A method for monitoring mask focus includes measuring profile asymmetries in a target feature including sub-resolution assist features and deriving a focus response based on a known correlation between the profile and focus of a corresponding mask. A computer system in a lithographic process may adjust mask focus based on such derived information to conform to a desired fabrication process.