Company Filing History:
Years Active: 2014
Title: James M Buntin: Innovator in Substrate Patterning
Introduction
James M Buntin is a notable inventor based in Boise, ID (US). He has made significant contributions to the field of substrate patterning, showcasing his innovative spirit through his patented methods. His work is particularly relevant in industries that require precision in material manipulation.
Latest Patents
James M Buntin holds a patent for "Methods of forming a pattern on a substrate." This patent describes a method that includes forming openings in the material of a substrate. The process involves widening these openings to join with immediately adjacent openings, ultimately forming spaced pillars comprised of the substrate material after the widening. This innovative approach has potential applications in various technological fields.
Career Highlights
Buntin is currently associated with Micron Technology Incorporated, a leading company in semiconductor manufacturing. His role at Micron allows him to apply his inventive skills in a practical setting, contributing to advancements in technology and materials science.
Collaborations
James has collaborated with notable colleagues such as Ranjan Khurana and Anton J deVillers. These partnerships have likely fostered a creative environment that enhances innovation and problem-solving within their projects.
Conclusion
James M Buntin exemplifies the spirit of innovation through his work in substrate patterning. His contributions, particularly his patented methods, reflect a commitment to advancing technology in meaningful ways.