The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 18, 2014
Filed:
Dec. 12, 2012
Applicant:
Micron Technology, Inc., Boise, ID (US);
Inventors:
Ranjan Khurana, Boise, ID (US);
Anton J. deVillers, Clifton Park, NY (US);
Kevin J. Torek, Meridian, ID (US);
Shane J. Trapp, Boise, ID (US);
Scott L. Light, Boise, ID (US);
James M. Buntin, Boise, ID (US);
Assignee:
Micron Technology, Inc., Boise, ID (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/308 (2006.01); B44C 1/22 (2006.01); H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
H01L 21/3086 (2013.01); H01L 21/302 (2013.01);
Abstract
A method of forming a pattern on a substrate includes forming openings in material of a substrate. The openings are widened to join with immediately adjacent of the openings to form spaced pillars comprising the material after the widening. Other embodiments are disclosed.