James Heejun Park

Title: Innovations of James Heejun Park in Semiconductor Technology.

Introduction

James Heejun Park is an accomplished inventor based in Cambridge, MA (US). He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent related to pattern shrink methods. His work has implications for the manufacturing of high-resolution semiconductor devices.

Latest Patents

James Heejun Park holds a patent for "Pattern shrink methods." This patent involves a series of steps that include providing a semiconductor substrate with one or more layers to be patterned, applying a resist pattern, and coating a shrink composition that consists of a polymer and an organic solvent. The polymer is designed to bond effectively with acid or alcohol groups on the resist pattern's surface. The process concludes with rinsing away the residual shrink composition, leaving a portion of the polymer bonded to the resist pattern. This invention is particularly valuable in the manufacture of semiconductor devices, enabling the creation of high-resolution patterns.

Career Highlights

Throughout his career, James has worked with notable companies such as Dow Global Technologies LLC and Rohm & Haas Electronic Materials LLC. His experience in these organizations has allowed him to refine his expertise in semiconductor technologies and contribute to advancements in the field.

Collaborations

James has collaborated with talented individuals in his field, including Phillip Dene Hustad and Jong Keun Park. These collaborations have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

James Heejun Park's contributions to semiconductor technology through his innovative patent demonstrate his expertise and commitment to advancing the field. His work continues to influence the manufacturing processes of high-resolution semiconductor devices.