Company Filing History:
Years Active: 2009-2011
Title: Innovations of James Elmer in Carbon Nanotube Technology
Introduction
James Elmer is a notable inventor based in Vancouver, WA (US). He has made significant contributions to the field of carbon nanotube technology, holding 2 patents that showcase his innovative approaches.
Latest Patents
One of his latest patents involves techniques for precision pattern transfer of carbon nanotubes from a photo mask to wafers. This method includes providing a carbon nanotube (CNT) layer on a substrate, depositing a hard mask film on the CNT layer, and optionally coating a bottom anti-reflective coating (BARC) layer on the hard mask film. A resist is then patterned on the BARC layer or directly on the hard mask film if the BARC layer is not included. The resist pattern is effectively transferred to the hard mask film by etching the BARC layer, if provided, and etching partly into the hard mask film without reaching the CNT layer. After stripping the resist and the BARC layer, the hard mask pattern is transferred to the CNTs by etching away the portions of the hard mask that have been partially etched.
Career Highlights
James Elmer is currently employed at Nantero, Inc., where he continues to develop innovative technologies in the field of nanotechnology. His work has been instrumental in advancing the applications of carbon nanotubes in various industries.
Collaborations
He has collaborated with notable coworkers such as Shiqun Gu and Peter McGrath, contributing to a dynamic research environment that fosters innovation.
Conclusion
James Elmer's contributions to carbon nanotube technology through his patents and work at Nantero, Inc. highlight his role as a significant inventor in the field. His innovative techniques pave the way for future advancements in nanotechnology.