This inventor holds 1 USPTO granted patent. Top assignees: Eaton Corporation, Nippon Telegraph and Telephone Corporation. Active years: 1989.
Company Filing History:
1 out of 5,989 
1 out of 5,300 
Years Active: 1989
Title: James E Hipple: Innovator in Ion Source Technology
Introduction
James E Hipple is a notable inventor based in Lexington, MA (US). He is recognized for his contributions to the field of ion implantation technology, particularly through his innovative patent related to electron cyclotron resonance ion sources.
Latest Patents
Hipple holds a patent for an electron cyclotron resonance ion source designed for ion implanters. This invention features an ionization chamber that is surrounded along its length by an electromagnet. The design includes several extraction electrodes at the output end of the ionization chamber, which allow positively charged oxygen ions to pass through apertures in the electrodes. The uniformity of the axially aligned magnetic field in the ionization chamber is enhanced through the use of a magnetically permeable electrode and non-magnetically permeable materials for mounting other electrodes.
Career Highlights
Throughout his career, James E Hipple has worked with prominent companies such as Eaton Corporation and Nippon Telegraph and Telephone Corporation. His experience in these organizations has contributed to his expertise in the field of ion source technology.
Collaborations
Hipple has collaborated with notable individuals in his field, including Iwao Watanabe and Gerald L Dionne. These collaborations have likely enriched his work and contributed to advancements in ion implantation technology.
Conclusion
James E Hipple's innovative work in electron cyclotron resonance ion sources has made a significant impact in the field of ion implantation. His contributions continue to influence advancements in technology and engineering.