The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 28, 1989

Filed:

Jun. 03, 1988
Applicant:
Inventors:

James E Hipple, Lexington, MA (US);

Gerald L Dionne, South Hamilton, MA (US);

Yasuhiro Torii, Atsugi, JP;

Masaru Shimada, Ishida, JP;

Iwao Watanabe, Ishida, JP;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J / ;
U.S. Cl.
CPC ...
2504 / ; 250427 ; 3133601 ; 3133631 ; 31511181 ;
Abstract

An electron cyclotron resonance ion source for an ion implanter. The source includes an ionization chamber surrounded along its length by an electromagnet. A number of extraction electrodes at an output end of the ionization chamber allow positively charged oxygen ions to pass through apertures in the electrodes. The uniformity of the axially aligned magnetic field in the ionization chamber is extended through the extraction electrode by a magnetically permeable electrode and through use of non-magnetically permeable material to mount others of said electrodes.


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