Ishida, Japan

Iwao Watanabe

This inventor holds 2 USPTO granted patents. Top assignees: Nippon Telegraph and Telephone Corporation, Eaton Corporation. Active years: 1989.


% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 2

Forward Citations = 54(Granted Patents)


Location History:

  • Ishida, JP (1989)
  • Kanagawa, JP (1989)

Company Filing History:


Years Active: 1989

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2 patents (USPTO):Explore Patents

Title: Iwao Watanabe: Innovator in Ion Source Technology

Introduction

Iwao Watanabe is a notable inventor based in Ishida, Japan. He has made significant contributions to the field of ion source technology, holding 2 patents that showcase his innovative approach to engineering.

Latest Patents

Watanabe's latest patents include the Electron Cyclotron Resonance Ion Source and the Microwave Ion Source. The Electron Cyclotron Resonance Ion Source is designed for ion implanters and features an ionization chamber surrounded by an electromagnet. This design allows positively charged oxygen ions to pass through extraction electrodes at the output end of the chamber. The uniformity of the magnetic field is enhanced through the use of magnetically permeable materials. The Microwave Ion Source utilizes a microwave and a magnetic field to create a narrow high-density plasma. It includes a multilayer structure of plates with varying dielectric constants and an ion extraction electrode that is strategically positioned within the plasma.

Career Highlights

Throughout his career, Watanabe has worked with prominent companies such as Nippon Telegraph and Telephone Corporation and Eaton Corporation. His experience in these organizations has contributed to his expertise in developing advanced ion source technologies.

Collaborations

Watanabe has collaborated with notable individuals in his field, including Yasuhiro Torii and Masaru Shimada. These partnerships have likely fostered innovation and the exchange of ideas in the realm of ion source technology.

Conclusion

Iwao Watanabe's contributions to ion source technology through his patents and collaborations highlight his role as a significant innovator in the field. His work continues to influence advancements in ion implantation and plasma generation.

Profile summary based on public USPTO records.
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