Midland, MI, United States of America

James C Tou


Average Co-Inventor Count = 2.1

ph-index = 10

Forward Citations = 560(Granted Patents)


Company Filing History:


Years Active: 1988-1998

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16 patents (USPTO):Explore Patents

Title: Celebrating the Innovations of Inventor James C. Tou

Introduction: James C. Tou is an accomplished inventor based in Midland, MI, with a remarkable portfolio of 16 patents. His contributions to the field of engineering and chemistry have led to significant advancements in various applications, particularly in the processing and treatment of chemical substances.

Latest Patents: Among his latest innovations is a patent for a coated plastic substrate, which presents a novel laminate structure. Additionally, he developed an apparatus for mixing at least partially immiscible liquids designed to optimize the removal of organic substances from chemical process streams. This invention involves a unique system that enables the injection of substances that are not entirely compatible with the liquid stream at high velocity, ensuring effective dissolution and treatment.

Career Highlights: James C. Tou is currently associated with The Dow Chemical Company, a leader in chemical manufacturing and innovation. His work at Dow has positioned him at the forefront of material science and chemical engineering, where his inventions have aimed to enhance both efficiency and sustainability in industrial processes.

Collaborations: Throughout his career, James has collaborated with esteemed colleagues such as Ing-Feng Hu and Mark A. LaPack. These partnerships have fostered a rich environment for innovation, combining expertise and insights from multiple fields to drive forward their research and development efforts.

Conclusion: James C. Tou's contributions to technology and innovation showcase the critical role inventors play in advancing industry practices. His dedication to improving chemical processes through inventive solutions not only exemplifies his expertise but also highlights the continuous evolution of modern technology. As he continues to innovate, the impact of his work will undoubtedly resonate across various applications for years to come.

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