The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 18, 1995
Filed:
Dec. 20, 1993
Ing-Feng Hu, Midland, MI (US);
James C Tou, Midland, MI (US);
The Dow Chemical Company, Midland, MI (US);
Abstract
An apparatus useful in preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, O, C and H in specific atom ratio wherein the polymer also contains certain functional groups. A power density of about 106 to about 108 J/Kg is employed in the plasma polymerization process. The apparatus comprises a plasma generating vacuum reaction vessel utilizing parallel plate electrodes. One of the electrodes comprises a magnetically enhanced shower head. A magnet is positioned in the interior of the shower head in contact with both the inner surfaces of the upper and lower portion thereof to concentrate the magnetic field above the upper surface of the shower head.