The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 1996
Filed:
Nov. 17, 1994
Applicant:
Inventors:
Ing-Feng Hu, Midland, MI (US);
James C Tou, Midland, MI (US);
Assignee:
The Dow Chemical Company, Midland, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08J / ;
U.S. Cl.
CPC ...
427489 ; 427294 ; 427493 ; 427571 ; 427574 ; 427578 ; 427585 ; 427598 ;
Abstract
A method of preparing a coated substrate is disclosed. The substrate is coated with a plasma generated polymer containing Si, O, C and H in specific atom ratio wherein the polymer also contains certain functional groups. A power density of about 10.sup.6 to about 10.sup.8 J/Kg is employed in the plasma polymerization process.
Hu, Ing-Feng. (1996). Method of forming a plasma polymerized film (U.S. Patent No. 5494712). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/5494712
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile