Williston, VT, United States of America

James B Clairmont


Average Co-Inventor Count = 6.7

ph-index = 1

Forward Citations = 11(Granted Patents)


Company Filing History:


Years Active: 2004-2008

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3 patents (USPTO):Explore Patents

Title: Innovations of James B Clairmont

Introduction

James B Clairmont is an accomplished inventor based in Williston, VT (US). He has made significant contributions to the field of design manipulation processes, particularly in chip and kerf design. With a total of 3 patents, Clairmont's work has had a notable impact on the efficiency and quality of wafer testing results.

Latest Patents

One of Clairmont's latest patents is a system and method of automatically generating kerf design data. This innovative method allows for the use of the same design manipulation processes for both chip design and kerf design. The concurrent generation of kerf designs and chip designs ensures a consistent, accurate, and repeatable process. This advancement leads to improved quality of wafer testing results, as the data in the kerf matches the data in the chip. Additionally, the total cycle time for mask manufacturing is reduced because kerf build is accomplished prior to the start of the mask manufacturing process. The patent also includes the use of load balancing across multiple servers during kerf and chip design to optimize computing resources.

Career Highlights

James B Clairmont is currently employed at International Business Machines Corporation (IBM). His work at IBM has allowed him to collaborate with other talented professionals in the field, enhancing the innovation process.

Collaborations

Some of Clairmont's notable coworkers include Karen Strube Edwards and Howard Ted Barrett. Their collaboration has contributed to the development of advanced technologies and innovative solutions in the industry.

Conclusion

James B Clairmont's contributions to the field of design manipulation processes have led to significant advancements in chip and kerf design. His innovative patents and collaborations with esteemed colleagues continue to shape the future of technology.

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