International Business Machines Corporation

James B Clairmont

Karen Strube Edwards

Pierre J Bouchard

Howard Ted Barrett

Maureen Fitzpatrick McFadden

Jeffrey C Stamm

John F Rudden, Jr

Florence Marie St Pierre Sears

Darlene Margaret Ross

Florence M Sears

Christopher S Yager

A method and system is provided to use the same design manipulation processes for both chip design and kerf design. Concurrent generation of kerf designs and chip designs provides a consistent, accurate, and repeatable process. Improved quality of wafer testing results because the data in the kerf matches data in the chip. The total cycle time for mask manufacturing is reduced because kerf build is accomplished prior to start of the mask manufacturing process. Also provided is the use of load balancing across multiple servers during kerf and chip design to optimize computing resources.

System and method of automatically generating kerf design data

A system and method in a computing network for generating an integrated circuit (IC) tapeout file at a remote client workstation by transmitting prompted IC technical data to the mask manufacturer. The process validates that the tapeout file is complete and accurate prior to generating the final IC tapeout file to be archived in the mask manufacturer's database.

System and method of preparing data for a semiconductor mask manufacturer

Growing community of inventors

Williston, VT, United States of America

James B Clairmont