This inventor holds 1 USPTO granted patent. Top assignee: Versum Materials US, LLC. Active years: 2026.
Company Filing History:
Years Active: 2026
Title: James A. Schlueter: Innovator in Chemical Mechanical Planarization
Introduction
James A. Schlueter is a notable inventor based in Phoenix, AZ (US). He has made significant contributions to the field of semiconductor manufacturing, particularly in the area of chemical mechanical planarization (CMP). His innovative work has led to advancements that enhance the efficiency and effectiveness of semiconductor device production.
Latest Patents
James A. Schlueter holds a patent for "Barrier chemical mechanical planarization slurries for cobalt films." This patent focuses on the development of cobalt barrier Chemical Mechanical Planarization (CMP) compositions, systems, and methods. These innovations are designed for the removal of cobalt or cobalt alloys from the surface of semiconductor devices during their manufacturing process. The compositions utilize various chemical additives, including aliphatic and aromatic organic carboxylic acids, abrasives, oxidizing agents, and corrosion inhibitors. This combination allows for tunable cobalt film removal rates and selectivity between cobalt and dielectric or other barrier films, while maintaining very low static etching rates on cobalt film.
Career Highlights
James A. Schlueter is currently employed at Versum Materials US, LLC, where he continues to develop cutting-edge solutions for the semiconductor industry. His expertise in CMP technology has positioned him as a key player in advancing manufacturing processes.
Collaborations
James has collaborated with Xiaobo Shi, contributing to the development of innovative CMP solutions. Their partnership has fostered advancements in the field, enhancing the capabilities of semiconductor manufacturing.
Conclusion
James A. Schlueter's contributions to the semiconductor industry through his innovative patent and work at Versum Materials US, LLC highlight his role as a significant inventor in the field of chemical mechanical planarization. His advancements continue to influence the efficiency of semiconductor device production.