Aurora, IL, United States of America

Jakub Nalaskowski


 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2016

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1 patent (USPTO):

Title: **The Innovations of Jakub Nalaskowski in Chemical-Mechanical Polishing**

Introduction

Jakub Nalaskowski, an inventive mind based in Aurora, Illinois, holds a significant patent in the realm of chemical-mechanical polishing compositions. His innovative approach has contributed to advancements in substrate polishing technology, showcasing his expertise in the field.

Latest Patents

Nalaskowski's patent focuses on mixed abrasive polishing compositions. This invention provides chemical-mechanical polishing compositions and methods designed for the effective polishing of a substrate. The compositions feature first abrasive particles consisting of ceria particles, along with second abrasive particles that can be either additional ceria particles, surface-modified silica particles, or organic particles. Furthermore, a pH-adjusting agent and an aqueous carrier are included, resulting in polishing compositions with multimodal particle size distributions. This patent represents a significant advancement for industries relying on precise polishing techniques.

Career Highlights

Currently, Jakub Nalaskowski is employed at Cabot Microelectronics Corporation, a leading company known for its specialized materials used in semiconductor manufacturing. His work emphasizes the development of innovative solutions in polishing technologies, which plays a crucial role in enhancing the efficiency of production processes.

Collaborations

Nalaskowski collaborates with notable colleagues, including Brian Reiss and Viet Lam. Their collective efforts contribute to the success of projects at Cabot Microelectronics Corporation, fostering a collaborative environment aimed at continuous innovation in polishing technology.

Conclusion

Jakub Nalaskowski's contributions to the field of chemical-mechanical polishing underline the importance of innovation within the industry. With his patent and ongoing collaborations, he continues to push the boundaries of what is possible in polishing compositions, ensuring that technology evolves and meets the demands of modern manufacturing needs.

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