Jai Matharu

Title: Jai Matharu: Innovator in Carbon Structure Separation

Introduction

Jai Matharu is a notable inventor based in Hertfordshire, GB. He has made significant contributions to the field of materials science, particularly in the area of carbon structures. His innovative approach has led to the development of a unique method for separating carbon structures from seed structures.

Latest Patents

Jai Matharu holds a patent for a method titled "Method for separating a carbon structure from a seed structure." This method involves depositing a carbon structure on a seed structure within a process chamber of a CVD reactor. The substrate, which includes both the seed and carbon structures, is heated to a specific process temperature. An etching gas, characterized by the chemical formula AOX, AOXY, or AX, is injected into the chamber. This gas reacts chemically with the seed structure, converting it into a gaseous reaction product, which is then removed from the chamber using a carrier gas flow. This innovative method showcases Jai's expertise in chemical processes and materials engineering.

Career Highlights

Jai Matharu is currently associated with Aixtron SE, a company known for its advanced technology in the field of semiconductor manufacturing. His work at Aixtron SE has allowed him to further develop his skills and contribute to cutting-edge research in carbon materials.

Collaborations

Jai has collaborated with notable colleagues, including Kenneth B K Teo and Alexandre Jouvray. These collaborations have enriched his research and expanded the impact of his innovations in the field.

Conclusion

Jai Matharu's contributions to the field of carbon structure separation highlight his innovative spirit and dedication to advancing materials science. His patent and work at Aixtron SE reflect his commitment to pushing the boundaries of technology.