Jagir S Multani

Title: The Innovative Contributions of Jagir S Multani

Introduction

Jagir S Multani is a notable inventor based in Fremont, California. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work primarily focuses on etchback processes for tungsten contact and via filling, which are crucial in semiconductor manufacturing.

Latest Patents

Jagir S Multani's latest patents include an innovative etchback process for tungsten contact/via filling. This process is designed to etch a refractory metal layer formed on a semiconductor substrate while minimizing the micro-loading effect. The etch process consists of three distinct steps. The first step involves a uniform etch using a gas chemistry of SF.sub.6, O.sub.2, and He, which removes most of the metal layer within a predetermined time. The second step employs a very uniform etch with a gas chemistry of SF.sub.6, Cl.sub.2, and He, continuing until the endpoint is detected through the measurement and integration of the 772 nm and 775 nm lines of Cl. The final step is a timed etch using Cl.sub.2 and He, serving both as an overetch to ensure complete removal of the refractory metal film and as a selective etchant for the adhesion underlayer.

Career Highlights

Jagir S Multani is currently employed at Intel Corporation, where he continues to advance semiconductor technologies. His expertise in etchback processes has positioned him as a valuable asset in the field.

Collaborations

Throughout his career, Jagir has collaborated with esteemed colleagues, including Xiao-Chun Mu and John K Chu. These collaborations have further enhanced the innovative nature of his work.

Conclusion

Jagir S Multani's contributions to semiconductor technology through his patents and collaborative efforts highlight his importance in the field. His innovative etchback processes are paving the way for advancements in semiconductor manufacturing.