This inventor holds 2 USPTO granted patents. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2017-2018.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2017-2018
Title: Innovations by Jae-Pil Lee
Introduction
Jae-Pil Lee is a notable inventor based in Hwaseong, South Korea. He has made significant contributions to the field of extreme ultraviolet (EUV) technology. With a total of 2 patents, his work focuses on enhancing the efficiency and safety of lithography apparatus.
Latest Patents
One of his latest patents is an "Apparatus and method of sensing liquid leakage for lithography apparatus." This invention aims to prevent contamination of the collector mirror by detecting leakage of cooling water supplied to it. The liquid leakage sensing apparatus comprises a collector mirror module, a cooling unit, a gas supply unit, and a sensing unit that identifies any water-soluble gas that has leaked.
Another significant patent is the "Apparatus for generating extreme ultraviolet light." This apparatus includes a droplet generator that reacts with light from a source to produce extreme ultraviolet light. It also features a droplet collector and a droplet detector equipped with multiple pressure sensors to monitor the position of the droplet.
Career Highlights
Jae-Pil Lee is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in the field of EUV technology. His work has been instrumental in advancing the capabilities of lithography systems used in semiconductor manufacturing.
Collaborations
He collaborates with talented coworkers, including Do-Hyun Seo and Sung-Jo Hwang, who contribute to the development of cutting-edge technologies in their field.
Conclusion
Jae-Pil Lee's contributions to the field of extreme ultraviolet technology through his patents demonstrate his commitment to innovation and excellence. His work at Samsung Electronics Co., Ltd. continues to push the boundaries of what is possible in lithography apparatus.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
